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3rd Topical Meeting on Optical Microsystems, Sept. 2009 in Capri
An interferometric test station for massive parallel inspection of passive and active M(O)EMS
Malgorzata Kujawinska (1), Kay Gastinger (2), Michal Jozwik(1), Karl H. Haugholt (2), Christoph Schaeffel (3), Stephan Beer (4)
(1) IMiF, Warsaw University of Technology, 02-525 Warsaw, Poland,
(2) SINTEF IKT, N-7465 Trondheim, Norway,
(3) IMMS, D-98693 Ilmenau, Germany
(4) CSEM, CH-8005 Zurich, Switzerland
e-mail: m.kujawinska@mchtr.pw.edu.pl
Abstract
The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of Micro(Opto)ElectroMechanicalSystems (M(O)EMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer array. Two preliminary interferometer designs are presented: a low coherent interferometer array based on the Mirau configuration and a laser interferometer array based on the Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on a scanning system and integration in a standard test station for micro-fabrication. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed.
You can download the full text of the paper from http://www.photonics.pl/PLP
